ESE Guest Seminar – “Challenges and Opportunities in Radio Frequency Power Conversion for Semiconductor Plasma Applications”
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CTA
Radio frequency (RF) plasma technology is essential in modern semiconductor fabrication, enabling precise processes such as etching and deposition. As the industry advances toward increasingly complex three-dimensional structures and smaller nanoscale features, the demands on plasma-based processing continue to grow. Meeting these demands requires a new generation of RF power conversion and control systems that […]

